GLOSSARY ENTRY (DERIVED FROM QUESTION BELOW) | ||||||
---|---|---|---|---|---|---|
|
20:42 Mar 21, 2001 |
English to Polish translations [PRO] Law/Patents | |||||||
---|---|---|---|---|---|---|---|
|
| ||||||
| Selected response from: Robert Pranagal Local time: 16:51 | ||||||
Grading comment
|
Summary of answers provided | ||||
---|---|---|---|---|
na | topologia układu scalonego |
|
topologia układu scalonego Explanation: MASK WORKS is : a series of related images, however fixed or encoded (1) having or representing the predetermined three-dimensional pattern of metallic, insulating, or semiconductor material present or removed from the layers of a semiconductor chip product; and (2) in which series the relation of the images to one another is that each image has the pattern of the surface of one form of the semiconductor chip product http://www.bitlaw.com/copyright/maskwork.html#definition TOPOLOGIA UKŁADU SCALONEGO prawa własno¶ci intelektualnych nie maj± zastosowania do topologii układów scalonych own engineering experience |
| |
Grading comment
| ||
Login to enter a peer comment (or grade) |
Login or register (free and only takes a few minutes) to participate in this question.
You will also have access to many other tools and opportunities designed for those who have language-related jobs (or are passionate about them). Participation is free and the site has a strict confidentiality policy.