maskwork

07:01 Mar 10, 2011
English to Serbian translations [PRO]
Law/Patents - Patents / maskwork
English term or phrase: maskwork
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A maskwork refers to the intellectual property right conferring time-limited exclusivity to reproduction of a particular layout.
A maskwork is defined by statute as: A series of related images, however fixed or encoded (1) having or presenting the predetermined pattern of metallic, insulating, or semiconductor chip product, and (2) in which series the relationship oath images has the pattern of the surface of one form of the semiconductor chip product.
vasilije krstic
Serbia
Local time: 23:08


Summary of answers provided
4topografija integrisanih kola
Zorica Djurkovic
Summary of reference entries provided
Maja Stevanovic

  

Answers


1 hr   confidence: Answerer confidence 4/5Answerer confidence 4/5
topografija integrisanih kola


Explanation:
http://www.proz.com/kudoz/english_to_serbian/law:_patents_tr...
Topografija, jeste na bilo koji način prikazan trodimenzionalni raspored elemenata, od kojih je najmanje jedan aktivan, i međuveza u integrisanom kolu, ili takav trodimenzionalni raspored pripremljen za proizvodnju određenog integrisanog kola.
Integrisano kolo, jeste gotov proizvod ili međuproizvod u kome se ostvaruje određena elektronska funkcija i u kome su elementi, od kojih je najmanje jedan aktivan, i međuveze integralno formirani u komadu materijala ili na komadu materijala, odnosno i u komadu i na komadu materijala.

http://en.wikipedia.org/wiki/Integrated_circuit_layout_desig...
In United States intellectual property law, a mask work is a two or three-dimensional layout or topography of an integrated circuit (IC or "chip"), i.e. the arrangement on a chip of semiconductor devices such as transistors and passive electronic components such as resistorsand interconnections. By extension, it also refers to the copyright-like intellectual property right conferring time-limited exclusivity to reproduction of a particular layout. The layout is called a mask work because, in photolithographic processes, the multiple etched layers within actual ICs are each created using a mask, called the photomask, to permit or block the light at specific locations, sometimes for hundreds of chips on a wafer simultaneously.


    Reference: http://www.proz.com/kudoz/english_to_serbian/law:_patents_tr...
    Reference: http://en.wikipedia.org/wiki/Integrated_circuit_layout_desig...
Zorica Djurkovic
United Kingdom
Local time: 22:08
Native speaker of: Serbian
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Reference comments


1 hr peer agreement (net): +2
Reference

Reference information:
http://www.proz.com/kudoz/english_to_serbo_croat/law:_contra...

Maja Stevanovic
Bosnia and Herzegovina
Native speaker of: Native in BosnianBosnian, Native in CroatianCroatian

Peer comments on this reference comment (and responses from the reference poster)
agree  Natasa Djurovic
1 hr
agree  Mira Stepanovic
4 days
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