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mask work rights

Romanian translation: topografie a unui circuit integrat

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GLOSSARY ENTRY (DERIVED FROM QUESTION BELOW)
English term or phrase:mask work
Romanian translation:topografie a unui circuit integrat
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03:26 Oct 4, 2001
English to Romanian translations [PRO]
Tech/Engineering
English term or phrase: mask work rights
Consultant further hereby assigns fully to the Company all right, title and interest in such Works and any copyrights, patents, mask work rights or other intellectual property rights relating to such Works.
Oana Dorobantu
Romania
Local time: 10:59
topografie a unui circuit integrat
Explanation:
In engleza: Mask Work: Mask Works are defined in the Act as: a series of related images, however fixed or encoded (1) having or representing the predetermined three-dimensional pattern of metallic, insulating, or semiconductor material present or removed from the layers of a semiconductor chip product; and (2) in which series the relation of the images to one another is that each image has the pattern of the surface of one form of the semiconductor chip product.

Legea 16/1995, art. privind protectia topografiilor circuitelor integrate, art. 2 alin. 2 - Prin topografie a unui circuit integrat, in sensul prezentei legi, denumita in continuare topografie, se intelege dispunerea tridimensionala - oricare ar fi expresia sa - a unor elemente ale unui circuit integrat, din care cel putin unul este un element activ, si a tuturor interconexiunilor sau a unei parti din interconexiunile circuitului integrat sau o astfel de dispunere tridimensionala pregatita pentru fabricarea circuitului integrat.

Succese,
Ion

Selected response from:

Ion Georgescu
Local time: 10:59
Grading comment
Va multumesc, ma intreb cum ati reusit sa imi dati atatea detalii intr-un timp atat de scurt. Felicitari! Sunteti cu adevarat un profesionist
4 KudoZ points were awarded for this answer

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Summary of answers provided
5topografie a unui circuit integratIon Georgescu
4asd


  

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32 mins   confidence: Answerer confidence 5/5
topografie a unui circuit integrat


Explanation:
In engleza: Mask Work: Mask Works are defined in the Act as: a series of related images, however fixed or encoded (1) having or representing the predetermined three-dimensional pattern of metallic, insulating, or semiconductor material present or removed from the layers of a semiconductor chip product; and (2) in which series the relation of the images to one another is that each image has the pattern of the surface of one form of the semiconductor chip product.

Legea 16/1995, art. privind protectia topografiilor circuitelor integrate, art. 2 alin. 2 - Prin topografie a unui circuit integrat, in sensul prezentei legi, denumita in continuare topografie, se intelege dispunerea tridimensionala - oricare ar fi expresia sa - a unor elemente ale unui circuit integrat, din care cel putin unul este un element activ, si a tuturor interconexiunilor sau a unei parti din interconexiunile circuitului integrat sau o astfel de dispunere tridimensionala pregatita pentru fabricarea circuitului integrat.

Succese,
Ion



Ion Georgescu
Local time: 10:59
PRO pts in pair: 8
Grading comment
Va multumesc, ma intreb cum ati reusit sa imi dati atatea detalii intr-un timp atat de scurt. Felicitari! Sunteti cu adevarat un profesionist
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55 days   confidence: Answerer confidence 4/5Answerer confidence 4/5
asd


Explanation:
asdasd


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