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mask work right

Spanish translation: Derechos sobre topografía de productos semiconductores

GLOSSARY ENTRY (DERIVED FROM QUESTION BELOW)
English term or phrase:mask work right
Spanish translation:Derechos sobre topografía de productos semiconductores
Entered by: Alejandro Umerez

22:18 Dec 4, 2004
English to Spanish translations [PRO]
Law/Patents - Law: Patents, Trademarks, Copyright
English term or phrase: mask work right
(a) “Derivative Works” means, (i) for material subject to copyright or mask work right protection, any work which as a whole, represents an original work of authorship, and is based upon one or more pre-existing works, such as a revision, modification, translation, abridgment, condensation, expansion, collection, compilation or any other form in which such pre-existing works may be recast, transformed or adapted;

MUCHAS GRACIAS
nikis
Local time: 22:47
topografía de productos semiconductores
Explanation:
Protección de las topografías de los productos semiconductores
Artículo 2
1. Los Estados miembros protegerán las topografías de los productos semiconductores mediante la adopción de disposiciones legales que concedan derechos exclusivos de conformidad con las disposiciones de la presente Directiva.
http://europa.eu.int/smartapi/cgi/sga_doc?smartapi!celexdoc!...
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A mask work is a kind of map or blueprint used to design and manufacture a semiconductor chip. The mask work defines the design of the chip in three dimensions, since a semiconductor chip consists of several layers of electronic circuits and elements that are laid down one atop another. The mask work images may be in pictorial or photographic form or broken down into digital numerical form for storage in a computer.

In the United States, the Semiconductor Chip Protection Act of 1984 (SCPA) created a new kind of sui generis exclusive right to certain aspects of the structural design of Semiconductor Chips. A mask work is the protected subject matter. A mask work can be registered under the SCPA with the U.S. Copyright Office. A notice of protection consists of M , *M*, or the words "mask work." The SCPA does not prevent independent development of a mask work, i.e., an identical but original second mask work is not an infringement of the first.
http://www.hayes-soloway.com/mask-work.html

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Note added at 1 day 17 mins (2004-12-05 22:35:39 GMT)
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Nikis, me estoy dando cuenta de que se me pasó el \'right\'. La traducción completa es: \"Derechos sobre topografía de productos semiconductores.\"
Selected response from:

Alejandro Umerez
Local time: 21:47
Grading comment
Muchas gracias por todo.
4 KudoZ points were awarded for this answer



Summary of answers provided
5topografía de productos semiconductores
Alejandro Umerez


  

Answers


1 hr   confidence: Answerer confidence 5/5
topografía de productos semiconductores


Explanation:
Protección de las topografías de los productos semiconductores
Artículo 2
1. Los Estados miembros protegerán las topografías de los productos semiconductores mediante la adopción de disposiciones legales que concedan derechos exclusivos de conformidad con las disposiciones de la presente Directiva.
http://europa.eu.int/smartapi/cgi/sga_doc?smartapi!celexdoc!...
-----------------------------------------------------------
A mask work is a kind of map or blueprint used to design and manufacture a semiconductor chip. The mask work defines the design of the chip in three dimensions, since a semiconductor chip consists of several layers of electronic circuits and elements that are laid down one atop another. The mask work images may be in pictorial or photographic form or broken down into digital numerical form for storage in a computer.

In the United States, the Semiconductor Chip Protection Act of 1984 (SCPA) created a new kind of sui generis exclusive right to certain aspects of the structural design of Semiconductor Chips. A mask work is the protected subject matter. A mask work can be registered under the SCPA with the U.S. Copyright Office. A notice of protection consists of M , *M*, or the words "mask work." The SCPA does not prevent independent development of a mask work, i.e., an identical but original second mask work is not an infringement of the first.
http://www.hayes-soloway.com/mask-work.html

--------------------------------------------------
Note added at 1 day 17 mins (2004-12-05 22:35:39 GMT)
--------------------------------------------------

Nikis, me estoy dando cuenta de que se me pasó el \'right\'. La traducción completa es: \"Derechos sobre topografía de productos semiconductores.\"

Alejandro Umerez
Local time: 21:47
Native speaker of: Spanish
PRO pts in category: 12
Grading comment
Muchas gracias por todo.
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