GLOSSARY ENTRY (DERIVED FROM QUESTION BELOW) | ||||
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19:42 Aug 5, 2001 |
English to Spanish translations [Non-PRO] Law/Patents | ||||
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| Selected response from: tazdog (X) Spain Local time: 12:15 | |||
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Summary of answers provided | ||||
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na | topografías / esquemas de trazado |
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na | una serie de imagenes tri-dimensionales relacionadas o vinculadas |
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na | Topografías de Productos semiconductores. |
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topografías / esquemas de trazado Explanation: Look at the following references: (La presión para que se proteja internacionalmente las topografías (mask work en la denominación en inglés) inicia en los EU. en 1984, cuando adopta el criterio de legislación sui generis, y condiciona la protección de las topografías creadas fuera de ese país al otorgamiento de un trato recíproco (art. 902), apartándose de los principios de los convenios de París (propiedad industrial) y de Berna (derecho de autor) respecto al trato nacional http://www.azc.uam.mx/publicaciones/alegatos/39-07.html SICE - Intellectual Property - National Legislation By ... ... Patents and Designs (Amendment) Ordinance, 1980 (215). Copyright Bill, 2000 / Ley de Derecho de Autor ... Protección de los Esquemas de Trazado (Topografías), 2000. ... www.sice.oas.org/int_prop/ipnale.asp - 96k Hope it helps. as noted |
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una serie de imagenes tri-dimensionales relacionadas o vinculadas Explanation: Hola Mariela! Confieso que no conozco bien la materia pero mi búsqueda por Internet arrojó la siguiente definición (en inglés) de lo que es "Mask Work": "Definition of Mask Work: Mask Works are defined in the Act as: a series of related images, however fixed or encoded (1) having or representing the predetermined three-dimensional pattern of metallic, insulating, or semiconductor material present or removed from the layers of a semiconductor chip product; and (2) in which series the relation of the images to one another is that each image has the pattern of the surface of one form of the semiconductor chip product". Véase: http://www.bitlaw.com/copyright/maskwork.html Espero esto te ayude:-) terry Arriba |
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Topografías de Productos semiconductores. Explanation: http://www.mcyt.es/tramites/Sectores o temas/patentes.htm http://www.oepm.es/internet/bases_datos/bdsitad.htm http://www.expoindustria.net/patentes.htm Una definicion : Mask Works "Mask Work" means a series of related images, however fixed or encoded, having or representing the predetermined, three-dimensional pattern of metallic, insulating or semiconductor material present or removed from the layers of a semiconductor chip product; and in which series the relation of the images to one another is that each image has the pattern of the surface of one form of the semiconductor chip product. Mask works are a relatively new form of intellectual property. Recognizing the unique nature of semiconductors and the semiconductor industry, Congress enacted the Semiconductor Protection Act of 1984 to protect the masks and other information, e.g., mask databases, used to manufacture semiconductor chip products. The term of protection for a mask work extends for a maximum of ten years from the earliest date that the mask work is either (1) registered; or (2) exploited commercially anywhere in the world. http://www.ornl.gov/tech_transfer/ip.htm |
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