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mask work

Spanish translation: topografías de semiconductores

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GLOSSARY ENTRY (DERIVED FROM QUESTION BELOW)
English term or phrase:mask work
Spanish translation:topografías de semiconductores
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19:42 Aug 5, 2001
English to Spanish translations [Non-PRO]
Law/Patents
English term or phrase: mask work
The object belongs to the context of the Intellectual Property Rights in the USA:
"The only protection Customs can give a mask work is by means of an ITC exclusion order or court order directing denial of entry of violative items.
Mariela Somohano
topografías / esquemas de trazado
Explanation:
Look at the following references:

(La presión para que se proteja internacionalmente las topografías (mask work en la denominación en inglés) inicia en los EU. en 1984, cuando adopta el criterio de legislación sui generis, y condiciona la protección de las topografías creadas fuera de ese país al otorgamiento de un trato recíproco (art. 902), apartándose de los principios de los convenios de París (propiedad industrial) y de Berna (derecho de autor) respecto al trato nacional
http://www.azc.uam.mx/publicaciones/alegatos/39-07.html

SICE - Intellectual Property - National Legislation By ...
... Patents and Designs (Amendment) Ordinance, 1980 (215). Copyright Bill, 2000 / Ley
de Derecho de Autor ... Protección de los Esquemas de Trazado (Topografías), 2000. ...
www.sice.oas.org/int_prop/ipnale.asp - 96k

Hope it helps.
Selected response from:

xxxtazdog
Spain
Local time: 11:45
Grading comment
Thank you very much for your time and interest!
4 KudoZ points were awarded for this answer

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Summary of answers provided
naTopografías de Productos semiconductores.
Miquel
nauna serie de imagenes tri-dimensionales relacionadas o vinculadas
Terry Burgess
natopografías / esquemas de trazadoxxxtazdog


  

Answers


2 hrs
topografías / esquemas de trazado


Explanation:
Look at the following references:

(La presión para que se proteja internacionalmente las topografías (mask work en la denominación en inglés) inicia en los EU. en 1984, cuando adopta el criterio de legislación sui generis, y condiciona la protección de las topografías creadas fuera de ese país al otorgamiento de un trato recíproco (art. 902), apartándose de los principios de los convenios de París (propiedad industrial) y de Berna (derecho de autor) respecto al trato nacional
http://www.azc.uam.mx/publicaciones/alegatos/39-07.html

SICE - Intellectual Property - National Legislation By ...
... Patents and Designs (Amendment) Ordinance, 1980 (215). Copyright Bill, 2000 / Ley
de Derecho de Autor ... Protección de los Esquemas de Trazado (Topografías), 2000. ...
www.sice.oas.org/int_prop/ipnale.asp - 96k

Hope it helps.


    as noted
xxxtazdog
Spain
Local time: 11:45
Native speaker of: English
PRO pts in pair: 910
Grading comment
Thank you very much for your time and interest!
Login to enter a peer comment (or grade)

4 hrs
una serie de imagenes tri-dimensionales relacionadas o vinculadas


Explanation:
Hola Mariela!
Confieso que no conozco bien la materia pero mi búsqueda por Internet arrojó la siguiente definición (en inglés) de lo que es "Mask Work":

"Definition of Mask Work: Mask Works are defined in the Act as: a series of related images, however fixed or encoded (1) having or representing the predetermined three-dimensional pattern of metallic, insulating, or semiconductor material present or removed from the layers of a semiconductor chip product; and (2) in which series the relation of the images to one another is that each image has the pattern of the surface of one form of the semiconductor chip product".

Véase:

http://www.bitlaw.com/copyright/maskwork.html

Espero esto te ayude:-)
terry


    Arriba
Terry Burgess
Mexico
Local time: 04:45
Native speaker of: Native in EnglishEnglish
PRO pts in pair: 3315
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7 hrs
Topografías de Productos semiconductores.


Explanation:
http://www.mcyt.es/tramites/Sectores o temas/patentes.htm

http://www.oepm.es/internet/bases_datos/bdsitad.htm

http://www.expoindustria.net/patentes.htm


Una definicion :
Mask Works "Mask Work" means a series of related images, however fixed or encoded, having or representing the predetermined, three-dimensional pattern of metallic, insulating or semiconductor material present or removed from the layers of a semiconductor chip product; and in which series the relation of the images to one another is that each image has the pattern of the surface of one form of the semiconductor chip product. Mask works are a relatively new form of intellectual property. Recognizing the unique nature of semiconductors and the semiconductor industry, Congress enacted the Semiconductor Protection Act of 1984 to protect the masks and other information, e.g., mask databases, used to manufacture semiconductor chip products. The term of protection for a mask work extends for a maximum of ten years from the earliest date that the mask work is either (1) registered; or (2) exploited commercially anywhere in the world.

http://www.ornl.gov/tech_transfer/ip.htm



Miquel
Spain
Local time: 11:45
PRO pts in pair: 578
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